Contact between Al nanocluster and Si (001) Substrate by Low energy deposition: Molecular dynamics modeling

چکیده مقاله

 A molecular dynamics simulation on the deposition of an energetic Al cluster on Si (001) substrate was studied. In this study to determine the equilibrium position of the system we investigate the  nanocluster height diffusion parameter on Si surface and shows that nanocluster is reached equilibrium on Substrate surface after 8 ps and the Atoms oscillate on the substrate surface  around the their equilibrium value. After that contact angle, contact area and change shape of nanocluster has been studied. For one impacting Al cluster, the migration distance of the cluster atoms and the deposition morphology were investigated under different substrate temperatures, impacting cluster energies and cluster sizes. It can be found that diffusion distance increases with the increasing substrate temperature, cluster energy and cluster size; moreover the shape of nanocluster also change under similar conditions.

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